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Water-developable resists based on glyceryl methacrylate for 193-nm lithography

Author(s):
  • Kim, J.-B. ( Korea Advanced Institute of Science and Technology (South Korea) )
  • Jang, J.-H. ( Korea Advanced Institute of Science and Technology (South Korea) )
  • Choi, J.-H. ( Korea Advanced Institute of Science and Technology (South Korea) )
  • Lee, K.-K. ( Korea Advanced Institute of Science and Technology (South Korea) )
  • Ko, J.-S. ( Korea Advanced Institute of Science and Technology (South Korea) )
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
616
Page(to):
624
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.1
Type:
Conference Proceedings

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