Impact of BARC on SEM shrinkage of ArF resist

Impact of BARC on SEM shrinkage of ArF resist

Author(s):

Lee, S.Y. ( Samsung Electronics Co., Ltd. (South Korea) )

Kim, M. ( Samsung Electronics Co., Ltd. (South Korea) )

Yoon, S. ( Samsung Electronics Co., Ltd. (South Korea) )

Kim, K.-M. ( Samsung Electronics Co., Ltd. (South Korea) )

Kim, J.H. ( Samsung Electronics Co., Ltd. (South Korea) )

Kim, H.-W. ( Samsung Electronics Co., Ltd. (South Korea) )

Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) )

Kim, Y.H. ( Samsung Electronics Co., Ltd. (South Korea) )

Chon, S.-M. ( Samsung Electronics Co., Ltd. (South Korea) )

Kishioka, T. ( Nissan Chemical Industries, Ltd. (Japan) )

Sone, Y. ( Nissan Chemical Industries, Ltd. (Japan) )

Nakajima, Y. ( Nissan Chemical Industries, Ltd. (Japan) )

7 more

Publication title:

Advances in Resist Technology and Processing XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5376

Pub. Year:

2004

Page(from):

575

Page(to):

582

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

Language:

English

Call no.:

P63600/5376.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013725
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2004 : 21st
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.24

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