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Fluoropolymers for 157-nm single-layer resists developed using a new etching rate estimation model (KI-Model)

Author(s):
Kawaguchi, Y. ( Asahi Glass Co., Ltd. (Japan) )
Sasaki, T. ( Asahi Glass Co., Ltd. (Japan) )
Irisawa, J. ( Asahi Glass Co., Ltd. (Japan) )
Yokokoji, O. ( Asahi Glass Co., Ltd. (Japan) )
Irie, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Otoguro, A. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Itani, T. ( NEC Electronics Corp. (Japan) )
Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
3 more
Publication title:
Advances in resist technology and processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
525
Page(to):
532
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.1
Type:
Conference Proceedings

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