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Application of photosensitive BARC and KrF resist on implant layers

Author(s):
Owe-Yang, D.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Ho, B.- ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Miyazaki, S. ( Clariant (Japan) K.K. (Japan) )
Katayama, T. ( Clariant (Japan) K.K. (Japan) )
Susukida, K. ( Clariant (Japan) K.K. (Japan) )
Kang, W. ( Clariant (Japan) K.K. (Japan) )
Chang, Y.-C. ( Clariant Taiwan Co., Ltd. (Taiwan) )
2 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
452
Page(to):
460
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.1
Type:
Conference Proceedings

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