Elimination of photoresist linewidth slimming by fluorination

Elimination of photoresist linewidth slimming by fluorination

Author(s):

Garza, C.M. ( Motorola, Inc. (USA) )
Conley, W.E. ( Motorola, Inc. (USA) )

Publication title:

Advances in Resist Technology and Processing XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5376

Pub. Year:

2004

Page(from):

294

Page(to):

301

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

Language:

English

Call no.:

P63600/5376.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013725
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2004 : 21st
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.24

Similar Items:

1 Conference Proceedings Considerations in the development of deep-UV photoresist materials and processes W.E. Conley Society of Photo-optical Instrumentation Engineers	7 Conference Proceedings Polymers for 157-nm photoresist applications:a progress report Patterson,K., Yamachika,M., Hung,R., Brodsky,C.J., Yamada,S., Somervell,M.H., Osborn,B., Hall,D., Dukovic,G., … SPIE - The International Society for Optical Engineering
2 Conference Proceedings Understanding the impact of full-field mask error factor Conley,W.E., Shi,X., Hankinson,M., Dusa,M.V., Socha,R.J., Garza,C. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Implications of immersion lithography on 193-nm photoresists Taylor, J.C., Chambers, C.R., Deschner, R., LeSuer, R.J., Conley, W.E., Burns, S.D., Willson, C.G. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Improved ion implantation masking through photoresist fluorination [6153-110] Montgomery, P. K., Peters, R. D., Garza, C., Breeden, T., Azrak, M., Jiang, J., Kim, K. SPIE - The International Society of Optical Engineering	9 Conference Proceedings 0.35-µm i-line poly processing with a bottom antireflective coating (BARC) W.L. Krisa, C.M. Garza, J.A. McKee Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings The MEEF shall inherit the Earth Conley,W., Garza,C.M., Dusa,M.V., Socha,R.J., Bendik,J.J., Mack,C.A. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Nonchemically amplified positive photoresist for synchrotron radiation x-ray lithography D. Bucca, A. Aviram, D.E. Seeger, W.E. Conley, W.R. Brunsvold Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings New positive-tone deep-UV photoresist based on poly(4-hydroxystyrene) and an acid labile protecting group J.T. Fahey, W.E. Conley, W.R. Brunsvold, D.C. Yang, W.M. Moreau Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings The application of high-refractive index photoresist for 32-nm device level imaging W. Conley SPIE - The International Society of Optical Engineering
6 Conference Proceedings Ring-test aberration determination and device lithography correlation Garza,C.M., Conley,W., Roman,B.J., Schippers,M., Foster,J., Baselmans,J., Cummings,K.D., Flagello,D.G. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Improved prediction of across chip linewidth variation (ACLV) with photomask aerial image CD metrology [6349-23] Poortinga, E., Zibold, A., Conley, W., Litt, L. C., Kasprowicz, B., Cangemi, M. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12