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Effects of airborne molecular contamination on 157-nm resists: AMC friend or foe?

Author(s):
Meute, J.J. ( IBM Corp. (USA) )
Rich, G. ( International SEMATECH (USA) )
Turnquest, K. ( Advanced Micro Devices, Inc. (USA) )
Dean, K. ( International SEMATECH (USA) )
Patel, S. ( International SEMATECH (USA) )
Graffenberg, V.L. ( International SEMATECH (USA) )
Rodriguez, M.P. ( International SEMATECH (USA) )
2 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
276
Page(to):
284
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.1
Type:
Conference Proceedings

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