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Comprehensive analysis of sources of total CD variation in ArF resist perspective

Author(s):
Kim, H.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, H.-R. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, K.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S.Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, B.-C. ( Samsung Electronics Co., Ltd. (South Korea) )
Oh, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
4 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
254
Page(to):
265
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.1
Type:
Conference Proceedings

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