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High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow

Author(s):
Joo, H.S. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Seo, D.C. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Kim, C.M. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Lim, Y.T. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Cho, S.D. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Lee, J.B. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Song, J.Y. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Kim, K.M. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Park, J.H. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Jung, J.C. ( Hynix Semiconductor Inc. (South Korea) )
Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) )
Bok, C.K. ( Hynix Semiconductor Inc. (South Korea) )
Moon, S.C. ( Hynix Semiconductor Inc. (South Korea) )
8 more
Publication title:
Advances in resist technology and processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. date:
2004
Page(from):
126
Page(to):
133
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.1
Type:
Conference Proceedings

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