High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow

High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow

Author(s):

Joo, H.S. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Seo, D.C. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Kim, C.M. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Lim, Y.T. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Cho, S.D. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Lee, J.B. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Song, J.Y. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Kim, K.M. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Park, J.H. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Jung, J.C. ( Hynix Semiconductor Inc. (South Korea) )

Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) )

Bok, C.K. ( Hynix Semiconductor Inc. (South Korea) )

Moon, S.C. ( Hynix Semiconductor Inc. (South Korea) )

8 more

Publication title:

Advances in resist technology and processing XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5376

Pub. Year:

2004

Page(from):

126

Page(to):

133

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

Language:

English

Call no.:

P63600/5376.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013725
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2004 : 21st
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.24

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