High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow

High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow

Author(s):

Joo, H.S. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Seo, D.C. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Kim, C.M. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Lim, Y.T. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Cho, S.D. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Lee, J.B. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Song, J.Y. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Kim, K.M. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Park, J.H. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Jung, J.C. ( Hynix Semiconductor Inc. (South Korea) )

Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) )

Bok, C.K. ( Hynix Semiconductor Inc. (South Korea) )

Moon, S.C. ( Hynix Semiconductor Inc. (South Korea) )

8 more

Publication title:

Advances in resist technology and processing XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5376

Pub. date:

2004

Page(from):

126

Page(to):

133

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

Language:

English

Call no.:

P63600/5376.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013725
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2004 : 21st
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.24

Similar Items:

1 Conference Proceedings Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology Joo, H.-S., Seo, D.C., Kim, C.M., Lim, Y.T., Cho, S.D., Lee, J.B., Jeon, H.P., Park, J.H., Jung, J.C., Shin, K.S., Bok, … SPIE-The International Society for Optical Engineering	7 Conference Proceedings Polarity effects of polymer on the 193-nm resist performance Choi, Y.-J., Kim, J.-., Kim, J.-Y., Yim, Y.-G., Kim, J., Jung, J.-C., Min, M.-J., Bok, C.K., Shin, K.-S. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Novel single-layer photoresist containing cycloolefins for 193 nm Park,J.-H., Seo,D.-C., Kim,K.-D., Park,S.-Y., Kim,S.-J., Lee,H., Jung,J.-C., Bok,C.-K., Baik,K.-H. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Nanomolecular resists with adamantane core for 193-nm lithography Kim, S.-K., An, I., Oh, H.-K., Lee, S. M., Bok, C. K., Moon, S. C. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Investigation of the effect of resist components and process condition on photochemical efficiency of ArF photoresist Kim, J.-W., Son, E.-K., Lee, S.-H., Kim, D., Kim, J., Lee, G., Jung, J.C., Bok, C.K., Moon, S.C., Shin, K.S. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Cycloolefin copolymer containing hindered hydroxyl group for 1 93nm photoresist Kim, S.-K., An, I., Oh, H.-K., Lee, S. M., Bok, C. K., Moon, S. C. SPIE - The International Society of Optical Engineering
4 Conference Proceedings PEB sensitivity variation of 193-nm resist according to activation energy of protection groups Oh, S.K., Kim, J.Y., Lee, J.W., Kim, D., Kim, J., Lee, G., Jung, J.C., Bok, C.K., Shin, K.S. SPIE - The International Society of Optical Engineering	10 Conference Proceedings New approach for pattern collapse problem by increasing contact area at sub-100nm patterning Lee, S.-K., Jung, J.C., Lee, M.S., Lee, S.K., Kim, S.Y., Hwang, Y.-S., Bok, C.K., Moon, S.-C., Shin, K.S., Kim, S.-J. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Photoresist adhesion effect of resist reflow process J. Park, J. Lee, M. Kim, J. Kim, S. Lee, C. Bok, S. Moon, S. Park, J. Hong, H. Oh SPIE - The International Society of Optical Engineering	11 Conference Proceedings Organosiloxane based bottom antireflective coatings for 193nm lithography Son, E.-K., Kim, J.-W., Lee, S.-H., Park, C.-S., Lee, J.-W., Kim, J., Lee, G.-S., Lee, S.-K., Ban, K.-D., Jung, J.-C., … SPIE - The International Society of Optical Engineering
6 Conference Proceedings New approach for 193-nm resist using modified cycloolefin resin Park, J.H., Seo, D.C., Kim, C.-M., Lim, Y.-T., Cho, S.-D., Lee, J.B., Joo,H.-S., Jeon, H.-P., Kim, S.-J., Jung, J.-C., … SPIE-The International Society for Optical Engineering	12 Conference Proceedings High-etch-rate ArF BARC composed of polyester Hwang, Y.S., Jung, J.C., Ban, K.D., Park, S., Bok, C.K., Moon, S.C., Shin, K.S. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12