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Using scanning electrochemical microscopy to probe chemistry at the solid-liquid interface in chemically amplified immersion lithography

Author(s):
LeSuer, R.J. ( Univ. of Texas/Austin (USA) )
Fan, F.-R.F. ( Univ. of Texas/Austin (USA) )
Bard, A.J. ( Univ. of Texas/Austin (USA) )
Taylor, J.C. ( Univ. of Texas/Austin (USA) )
Tsiartas, P. ( Univ. of Texas/Austin (USA) )
Willson, G. ( Univ. of Texas/Austin (USA) )
Conley, W.E. ( International SEMATECH (USA) and Motorola (USA) )
Feit, G. ( International SEMATECH (USA) )
Kunz, R.R. ( MIT Lincoln Labs. (USA) )
4 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
115
Page(to):
125
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.1
Type:
Conference Proceedings

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