193-nm negative resist based on acid-catalyzed elimination of polar molecules

193-nm negative resist based on acid-catalyzed elimination of polar molecules

Author(s):

Sooriyakumaran, R. ( IBM Almaden Research Ctr. (USA) )

Davis, B.W. ( IBM Almaden Research Ctr. (USA) )

Larson, C.E. ( IBM Almaden Research Ctr. (USA) )

Brock, P.J. ( IBM Almaden Research Ctr. (USA) )

DiPietro, R.A. ( IBM Almaden Research Ctr. (USA) )

Wallow, T.I. ( IBM Almaden Research Ctr. (USA) )

Connor, E.F. ( IBM Almaden Research Ctr. (USA) )

Sundberg, L.K. ( IBM Almaden Research Ctr. (USA) )

Breyta, G. ( IBM Almaden Research Ctr. (USA) )

Allen, R.D. ( IBM Almaden Research Ctr. (USA) )

Patel, K.S. ( IBM Microelectronics Div. (USA) )

Varanasi, P.R. ( IBM Microelectronics Div. (USA) )

7 more

Publication title:

Advances in Resist Technology and Processing XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5376

Pub. Year:

2004

Page(from):

71

Page(to):

78

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

Language:

English

Call no.:

P63600/5376.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013725
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2004 : 21st
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.24

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