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Quencher gradient resist process for low-k process

Author(s):
Jung, J.C. ( Hynix Semiconductor Inc. (South Korea) )
Lee, S.K. ( Hynix Semiconductor Inc. (South Korea) )
Lee, W.W. ( Hynix Semiconductor Inc. (South Korea) )
Bok, C.K. ( Hynix Semiconductor Inc. (South Korea) )
Moon, S.C. ( Hynix Semiconductor Inc. (South Korea) )
Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) )
1 more
Publication title:
Advances in resist technology and processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. date:
2004
Page(from):
63
Page(to):
70
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.1
Type:
Conference Proceedings

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