Liquid immersion lithography: evaluation of resist issues

Liquid immersion lithography: evaluation of resist issues

Author(s):

Hinsberg, W. ( IBM Almaden Research Ctr. (USA) )

Wallraff, G.M. ( IBM Almaden Research Ctr. (USA) )

Larson, C.E. ( IBM Almaden Research Ctr. (USA) )

Davis, B.W. ( IBM Almaden Research Ctr. (USA) )

Deline, V. ( IBM Almaden Research Ctr. (USA) )

Raoux, S. ( IBM Almaden Research Ctr. (USA) )

Miller, D. ( IBM Almaden Research Ctr. (USA) )

Houle, F.A. ( IBM Almaden Research Ctr. (USA) )

Hoffnagle, J. ( IBM Almaden Research Ctr. (USA) )

Sanchez, M.I. ( IBM Almaden Research Ctr. (USA) )

Rettner, C. ( IBM Almaden Research Ctr. (USA) )

Sundberg, L.K. ( IBM Almaden Research Ctr. (USA) )

Medeiros, D.R. ( IBM Thomas J. Watson Research Ctr. (USA) )

Dammel, R.R. ( Clariant Corp. (USA) )

Conley, W.E. ( Motorola, Inc. (USA) )

10 more

Publication title:

Advances in Resist Technology and Processing XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5376

Pub. Year:

2004

Page(from):

21

Page(to):

33

Pages:

13

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

Language:

English

Call no.:

P63600/5376.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013725
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2004 : 21st
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.24

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