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Application of spectroscopic ellipsometry-based scatterometry for ultrathin spacer structure

Author(s):
Chen, R.C.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chen, F.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Luo, Y.-Y. ( KLA-Tencor Corp. (USA) )
Perng, B.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chiu, Y.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Tao, H.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
1 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
1374
Page(to):
1381
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.2
Type:
Conference Proceedings

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