Innovative rapid photogoniometry method for CD metrology
- Author(s):
Boher, P. ( Electronics for Displays and Imaging Devices SA (France) ) Luet, M. ( Electronics for Displays and Imaging Devices SA (France) ) Leroux, T. ( Electronics for Displays and Imaging Devices SA (France) ) Petit, J. ( Electronics for Displays and Imaging Devices SA (France) ) Barritault, P. ( CEA-LETI (France) ) Hazart, J. ( CEA-LETI (France) ) Chaton, P. ( CEA-LETI (France) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5375
- Pub. Year:
- 2004
- Page(from):
- 1302
- Page(to):
- 1313
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452887 [0819452882]
- Language:
- English
- Call no.:
- P63600/5375.2
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
A new analysis strategy for CD metrology using rapid photo goniometry method
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Influence of the real-life structures in optical metrology using spectroscopic scatterometry analysis [5858-12]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Scatterometry based CD and profile metrology of MoSi/ quartz structures [5992-153]
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Light-scattered measurements using Fourier optics: a new tool for surface characterization
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Polarized gonio fluorimetric measurements of DNA-chip: a step forward Towards fluorescence quantification
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Application of scatterometry for CD and profile metrology in 193-nm lithography process development
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |