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Prospects for using primary electron-based CD metrology

Author(s):
Rice, B.J. ( Intel Corp. (USA) )
Crays, G.L. ( Intel Corp. (USA) )
Danilevsky, A. ( Hitachi High-Technologies Corp. (USA) )
Grumski, M.G. ( Intel Corp. (USA) )
Koshihara, S. ( Hitachi Science Systems, Ltd. (Japan) )
Otaka, T. ( Hitachi High-Technologies Corp. (Japan) )
Roberts, J.M. ( Intel Corp. (USA) )
2 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. date:
2004
Page(from):
1247
Page(to):
1253
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.2
Type:
Conference Proceedings

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