Qualification of a low-cost high-quality reticle process for 90-nm contact layers

Qualification of a low-cost high-quality reticle process for 90-nm contact layers

Author(s):

Strozewski, K.J. ( Motorola (USA) )

Perez, J. ( Motorola (USA) )

Carter, R. ( Motorola (USA) )

Kiefer, R. ( DuPont Photomasks, Inc. (USA) )

Jackson, C. ( DuPont Photomasks, Inc. (USA) )

MacDonald, S. ( DuPont Photomasks, Inc. (USA) )

Kalk, F. ( DuPont Photomasks, Inc. (USA) )

2 more

Publication title:

Metrology, Inspection, and Process Control for Microlithography XVIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5375

Pub. Year:

2004

Page(from):

1191

Page(to):

1198

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452887 [0819452882]

Language:

English

Call no.:

P63600/5375.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013724
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2004 : 18th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.26

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