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OCD study of critical dimension and line-shape control of shallow-trench-isolation structures

Author(s):
Feng, Y. ( Nanometrics, Inc. (USA) )
Zhang, X. ( Nanometrics, Inc. (USA) )
Cheung, B. ( Nanometrics, Inc. (USA) )
Liu, Z. ( Nanometrics, Inc. (USA) )
Isao, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Hayashi, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
1 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
1173
Page(to):
1182
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.2
Type:
Conference Proceedings

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