Simulation-based mask quality control in a production environment

Simulation-based mask quality control in a production environment

Author(s):

Pang, L. ( Synopsys, Inc. (USA) )

Chen, J.-H. ( Synopsys, Inc. (USA) )

Cai, L. ( Synopsys, Inc. (USA) )

Lee, D. ( United Microelectronic Corp. (Taiwan China) )

Chu, B. ( United Microelectronic Corp. (Taiwan China) )

Huang, V. ( United Microelectronic Corp. (Taiwan China) )

Fang, T.-Y. ( United Microelectronic Corp. (Taiwan China) )

2 more

Publication title:

Metrology, Inspection, and Process Control for Microlithography XVIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5375

Pub. Year:

2004

Page(from):

1087

Page(to):

1097

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452887 [0819452882]

Language:

English

Call no.:

P63600/5375.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013724
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2004 : 18th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.26

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