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Influence of line-edge roughness on MOSFET devices with sub-50-nm gates

Author(s):
  • Shibata, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Izumi, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Tsujita, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
865
Page(to):
873
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.2
Type:
Conference Proceedings

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