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Time-based PEB adjustment for optimizing CD distributions

Author(s):
Friedberg, P.D. ( Univ. of California/Berkeley (USA) and Advanced Micro Devices, Inc. (USA) )
Tang, C. ( Advanced Micro Devices, Inc. (USA) )
Singh, B. ( Advanced Micro Devices, Inc. (USA) )
Brueckner, T. ( Advanced Micro Devices, Inc. (Germany) )
Gruendke, W. ( Advanced Micro Devices, Inc. (Germany) )
Schulz, B. ( Advanced Micro Devices, Inc. (Germany) )
Spanos, C.J. ( Univ. of California/Berkeley (USA) )
2 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
703
Page(to):
712
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.1
Type:
Conference Proceedings

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