Blank Cover Image

Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis

Author(s):
Sendelbach, M. ( IBM Microelectronics Div. (USA) )
Archie, C.N. ( IBM Microelectronics Div. (USA) )
Banke, B. ( IBM Microelectronics Div. (USA) )
Mayer, J. ( IBM Microelectronics Div. (USA) )
Nii, H. ( Toshiba America Electronic Components, Inc. (USA) )
Herrera, P. ( KLA-Tencor Corp. (USA) )
Hankinson, M. ( KLA-Tencor Corp. (USA) )
2 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
550
Page(to):
563
Pages:
14
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.1
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Scatterometry measurement precision and accuracy below 70 nm

Sendelbach, M., Archie, C.N.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Characterization of 32nm node BEOL grating structures using scatterometry

S. Zangooie, M. Sendelbach, M. Angyal, C. Archie, A. Vaid

Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Improving sub-150-nm lithography and etch CD-SEM correlations to AFM and electrical test

Solecky, E.P., Mayer, J., Archie, C.N.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Enabling gate etch process development using scatterometry

J. Koshy, M. Sendelbach, P. Herrera

SPIE - The International Society of Optical Engineering
3 Conference Proceedings New apparent beam width artifact and measurement methodology for CD-SEM resolution monitoring

Mayer, J.A., Huizenga, K.J., Solecky, E.P., Archie, C.N., Banke, G.W. Jr.,, Cogley, R.M., Nathan, C., Robert, J.M.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Characterization of capacitive 3D deep trench mask open structures using scatterometry

S. Zangooie, P. Herrera, A. Mesfin, C. Archie, M. Sendelbach

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology

Banke, B., Archie, C.N., Sendelbach, M., Robert, J., Slinkman, J.A., Kaszuba, P., Kontra, R., DeVries, M., Solecky, E.P.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Predicting electrical measurements by applying scatterometry to complex spacer structures

M. Sendelbach, J. Ayala, P. Herrera

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Monitoring printing fidelity with image correlation measurements on the CD SEM

Archie,C.N., Solecky,E.P., Hayes,T.S., Banke,G.W.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Investigation on the mechanism of the 193-nm resist linewidth reduction during the SEM measurement

Wu,C.-H.J., Huang,W.-S., Chen,K.-J.R., Archie,C.N., Lagus,M.E.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Feedforward of mask open measurements on an integrated scatterometer to improve gate linewidth control

Sendelbach, M., Natzle, W., Archie, C.N., Banke, B., Prager, D., Engelhard, D., Ferns, J., Yamashita, A., Funk, M., …

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Toward a unified advanced CD-SEM specification for sub-0.18-ｦﾌm technology

Allgair,J., Archie,C.N., Banke,W., Bogardus,H., Griffith,J.E., Marchman,H.M., Postek,M.T., Saraf,L.H., Schlesinger,J.E., …

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12