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Successful application of angular scatterometry to process control in sub-100-nm DRAM device

Author(s):
Kim, J.- ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, S.-J. ( Samsung Electronics Co., Ltd. (South Korea) )
Chin, S.-B. ( Samsung Electronics Co., Ltd. (South Korea) )
Oh, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Goo, D.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S.-J. ( Samsung Electronics Co., Ltd. (South Korea) )
Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Moon, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
Raymond, C.J. ( Accent Optical Technologies, Inc. (USA) )
Littau, M.E. ( Accent Optical Technologies, Inc. (USA) )
Youn, B.J. ( Accent Optical Technologies, Inc. (South Korea) )
Sohn, C.-J. ( Accent Optical Technologies, Inc. (South Korea) )
9 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
541
Page(to):
549
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.1
Type:
Conference Proceedings

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