Successful application of angular scatterometry to process control in sub-100-nm DRAM device
- Author(s):
Kim, J.- ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, S.-J. ( Samsung Electronics Co., Ltd. (South Korea) ) Chin, S.-B. ( Samsung Electronics Co., Ltd. (South Korea) ) Oh, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Goo, D.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Lee, S.-J. ( Samsung Electronics Co., Ltd. (South Korea) ) Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) ) Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) ) Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) Moon, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) ) Raymond, C.J. ( Accent Optical Technologies, Inc. (USA) ) Littau, M.E. ( Accent Optical Technologies, Inc. (USA) ) Youn, B.J. ( Accent Optical Technologies, Inc. (South Korea) ) Sohn, C.-J. ( Accent Optical Technologies, Inc. (South Korea) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5375
- Pub. Year:
- 2004
- Page(from):
- 541
- Page(to):
- 549
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452887 [0819452882]
- Language:
- English
- Call no.:
- P63600/5375.1
- Type:
- Conference Proceedings
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