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Determination of optimal parameters for CD-SEM measurement of line-edge roughness

Author(s):
Bunday, B.D. ( International SEMATECH (USA) )
Bishop, M. ( International SEMATECH (USA) )
McCormack, D.W., Jr. ( International SEMATECH (USA) )
Villarrubia, J.S. ( National Institute of Standards and Technology (USA) )
Vladar, A.E. ( National Institute of Standards and Technology (USA) )
Dixson, R. ( National Institute of Standards and Technology (USA) )
Vorburger, T.V. ( National Institute of Standards and Technology (USA) )
Orji, N.G. ( National Institute of Standards and Technology (USA) )
Allgair, J.A. ( Motorola (USA) and International SEMATECH (USA) )
4 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
515
Page(to):
533
Pages:
19
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.1
Type:
Conference Proceedings

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