OPC accuracy and process window verification methodology for sub-100-nm node
- Author(s):
Yang, H. ( Hynix Semiconductor, Inc. (South Korea) ) Park, C. ( Hynix Semiconductor, Inc. (South Korea) ) Hong, J. ( Hynix Semiconductor, Inc. (South Korea) ) Jeong, G. ( Hynix Semiconductor, Inc. (South Korea) ) Cho, B. ( Hynix Semiconductor, Inc. (South Korea) ) Choi, J. ( Hynix Semiconductor, Inc. (South Korea) ) Kang, C. ( Hynix Semiconductor, Inc. (South Korea) ) Yang, K. ( Hynix Semiconductor, Inc. (South Korea) ) Kang, E. ( Hynix Semiconductor, Inc. (South Korea) ) Ji, S. ( Hynix Semiconductor, Inc. (South Korea) ) Yim, D. ( Hynix Semiconductor, Inc. (South Korea) ) Song, Y. ( Hynix Semiconductor, Inc. (South Korea) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5375
- Pub. Year:
- 2004
- Page(from):
- 437
- Page(to):
- 443
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452887 [0819452882]
- Language:
- English
- Call no.:
- P63600/5375.1
- Type:
- Conference Proceedings
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