Evaluation of new in-chip and arrayed line overlay target designs
- Author(s):
Attota, R. ( National Institute of Standards and Technology (USA) ) Silver, R.M. ( National Institute of Standards and Technology (USA) ) Bishop, M. ( International SEMATECH (USA) ) Marx, E. ( National Institute of Standards and Technology (USA) ) Jun, J.-S.J. ( National Institute of Standards and Technology (USA) ) Stocker, M. ( National Institute of Standards and Technology (USA) ) Davidson, M.P. ( Spectel Company (USA) ) Larrabee, R.D. ( National Institute of Standards and Technology (USA) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5375
- Pub. Year:
- 2004
- Page(from):
- 395
- Page(to):
- 402
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452887 [0819452882]
- Language:
- English
- Call no.:
- P63600/5375.1
- Type:
- Conference Proceedings
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