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Evaluation of new in-chip and arrayed line overlay target designs

Author(s):
Attota, R. ( National Institute of Standards and Technology (USA) )
Silver, R.M. ( National Institute of Standards and Technology (USA) )
Bishop, M. ( International SEMATECH (USA) )
Marx, E. ( National Institute of Standards and Technology (USA) )
Jun, J.-S.J. ( National Institute of Standards and Technology (USA) )
Stocker, M. ( National Institute of Standards and Technology (USA) )
Davidson, M.P. ( Spectel Company (USA) )
Larrabee, R.D. ( National Institute of Standards and Technology (USA) )
3 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
395
Page(to):
402
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.1
Type:
Conference Proceedings

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