Improving the uncertainty of photomask linewidth measurements

Author(s):

• Pedulla, J.M. ( Consultant to National Institute of Standards and Technology (USA) )
• Potzick, J. ( National Institute of Standards and Technology (USA) )
• Silver, R.M. ( National Institute of Standards and Technology (USA) )

Publication title:

Metrology, Inspection, and Process Control for Microlithography XVIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5375

Pub. Year:

2004

Page(from):

317

Page(to):

327

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452887 [0819452882]

Language:

English

Call no.:

P63600/5375.1

Type:

Conference Proceedings