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Effects of different processing conditions on line-edge roughness for 193-nm and 157-nm resists

Author(s):
Ercken, M. ( IMEC (Belgium) )
Leunissen, L.H.A. ( IMEC (Belgium) )
Pollentier, I. ( IMEC (Belgium) )
Patsis, G.P. ( Institute of Microelectronics (Greece) )
Constantoudis, V. ( Institute of Microelectronics (Greece) )
Gogolides, E. ( Institute of Microelectronics (Greece) )
1 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
266
Page(to):
275
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.1
Type:
Conference Proceedings

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