A new analysis strategy for CD metrology using rapid photo goniometry method
- Author(s):
Petit, J. ( Electronics for Displays and Imaging Devices SA (France) ) Barritault, P. ( CEA-LETI (France) ) Hazart, J. ( CEA-LETI (France) ) Chaton, P. ( CEA-LETI (France) ) Boher, P. ( Electronics for Displays and Imaging Devices SA (France) ) Luet, M. ( Electronics for Displays and Imaging Devices SA (France) ) Leroux, T. ( Electronics for Displays and Imaging Devices SA (France) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5375
- Pub. Year:
- 2004
- Page(from):
- 210
- Page(to):
- 221
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452887 [0819452882]
- Language:
- English
- Call no.:
- P63600/5375.1
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Thin film design using simulated annealing and study of the filter robustness
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Light-scattered measurements using Fourier optics: a new tool for surface characterization
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
5
Conference Proceedings
Influence of the real-life structures in optical metrology using spectroscopic scatterometry analysis [5858-12]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry
SPIE - The International Society of Optical Engineering |