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A new analysis strategy for CD metrology using rapid photo goniometry method

Author(s):
Petit, J. ( Electronics for Displays and Imaging Devices SA (France) )
Barritault, P. ( CEA-LETI (France) )
Hazart, J. ( CEA-LETI (France) )
Chaton, P. ( CEA-LETI (France) )
Boher, P. ( Electronics for Displays and Imaging Devices SA (France) )
Luet, M. ( Electronics for Displays and Imaging Devices SA (France) )
Leroux, T. ( Electronics for Displays and Imaging Devices SA (France) )
2 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. date:
2004
Page(from):
210
Page(to):
221
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.1
Type:
Conference Proceedings

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