CD metrology for the 45-nm and 32-nm nodes
- Author(s):
Rice, B.J. ( Intel Corp. (USA) ) Cao, H.B. ( Intel Corp. (USA) ) Chaudhuri, O. ( Lawrence Berkeley National Lab. (USA) ) Grumski, M.G. ( Intel Corp. (USA) ) Harteneck, B.D. ( Lawrence Berkeley National Lab. (USA) ) Liddle, A. ( Lawrence Berkeley National Lab. (USA) ) Olynick, D. ( Lawrence Berkeley National Lab. (USA) ) Roberts, J.M. ( Intel Corp. (USA) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5375
- Pub. Year:
- 2004
- Page(from):
- 183
- Page(to):
- 190
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452887 [0819452882]
- Language:
- English
- Call no.:
- P63600/5375.1
- Type:
- Conference Proceedings
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