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CD metrology for the 45-nm and 32-nm nodes

Author(s):
Rice, B.J. ( Intel Corp. (USA) )
Cao, H.B. ( Intel Corp. (USA) )
Chaudhuri, O. ( Lawrence Berkeley National Lab. (USA) )
Grumski, M.G. ( Intel Corp. (USA) )
Harteneck, B.D. ( Lawrence Berkeley National Lab. (USA) )
Liddle, A. ( Lawrence Berkeley National Lab. (USA) )
Olynick, D. ( Lawrence Berkeley National Lab. (USA) )
Roberts, J.M. ( Intel Corp. (USA) )
3 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
183
Page(to):
190
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.1
Type:
Conference Proceedings

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