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Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology

Author(s):
Banke, B. ( IBM Corp. (USA) )
Archie, C.N. ( IBM Corp. (USA) )
Sendelbach, M. ( IBM Corp. (USA) )
Robert, J. ( IBM Corp. (USA) )
Slinkman, J.A. ( IBM Corp. (USA) )
Kaszuba, P. ( IBM Corp. (USA) )
Kontra, R. ( IBM Corp. (USA) )
DeVries, M. ( IBM Corp. (USA) )
Solecky, E.P. ( IBM Microelectronics Division (USA) )
4 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
133
Page(to):
150
Pages:
18
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.1
Type:
Conference Proceedings

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