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Alignment in chromeless masks

Author(s):
Mukherjee-Roy, M. ( Institute of Microelectronics (Singapore) )
Singh, N. ( Institute of Microelectronics (Singapore) )
Mehta, S.S. ( Institute of Microelectronics (Singapore) )
Suda, H. ( HOYA Corp. (Japan) )
Kubota, T. ( HOYA Corp. (Japan) )
Kimura, Y. ( HOYA Corp. (Japan) )
Kinoshita, H. ( HOYA Corp. (Japan) )
2 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
96
Page(to):
104
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.1
Type:
Conference Proceedings

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