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Layout decompression chip for maskless lithography

Author(s):
Nikolic, B. ( Univ. of California/Berkeley (USA) )
Wild, B. ( Univ. of California/Berkeley (USA) )
Dai, V. ( Univ. of California/Berkeley (USA) )
Shroff, Y.A. ( Univ. of California/Berkeley (USA) )
Warlick, B. ( Univ. of California/Berkeley (USA) )
Zakhor, A. ( Univ. of California/Berkeley (USA) )
Oldham, W.G. ( Univ. of California/Berkeley (USA) )
2 more
Publication title:
Emerging Lithographic Technologies VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5374
Pub. Year:
2004
Page(from):
1092
Page(to):
1099
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452870 [0819452874]
Language:
English
Call no.:
P63600/5374.2
Type:
Conference Proceedings

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