Techniques for directly measuring the absorbance of photoresists at EUV wavelengths
- Author(s):
Chandhok, M. ( Intel Corp. (USA) ) Cao, H. ( Intel Corp. (USA) ) Yueh, W. ( Intel Corp. (USA) ) Gullikson, E.M. ( Lawrence Berkeley National Lab. (USA) ) Brainard, R.L. ( Rohm and Haas Microelectronics (USA) ) Robertson, S.A. ( Rohm and Haas Microelectronics (USA) ) - Publication title:
- Emerging Lithographic Technologies VIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5374
- Pub. Year:
- 2004
- Page(from):
- 861
- Page(to):
- 868
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452870 [0819452874]
- Language:
- English
- Call no.:
- P63600/5374.2
- Type:
- Conference Proceedings
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