Lateral shearing interferometer for EUVL: theoretical analysis and experiment
- Author(s):
Zhu, Y. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Sugisaki, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Ouchi, C. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Hasegawa, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Niibe, M. ( Himeji Institute of Technology (Japan) ) Suzuki, A. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Murakami, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) - Publication title:
- Emerging Lithographic Technologies VIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5374
- Pub. Year:
- 2004
- Page(from):
- 824
- Page(to):
- 832
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452870 [0819452874]
- Language:
- English
- Call no.:
- P63600/5374.2
- Type:
- Conference Proceedings
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