High-throughput EUV reflectometer for EUV mask blanks

High-throughput EUV reflectometer for EUV mask blanks

Author(s):

Lebert, R. ( AIXUV GmbH (Germany) )

Wies, C. ( AIXUV GmbH (Germany) )

Juschkin, L. ( AIXUV GmbH (Germany) )

Jaegle, B. ( AIXUV GmbH (Germany) )

Meisen, M. ( AIXUV GmbH (Germany) )

Aschke, L. ( Schott Lithotec AG (Germany) )

Sobel, F. ( Schott Lithotec AG (Germany) )

Seitz, H. ( Schott Lithotec AG (Germany) )

Scholze, F. ( Physikalisch-Technische Bundesanstalt (Germany) )

Ulm, G. ( Physikalisch-Technische Bundesanstalt (Germany) )

Walter, K. ( Fraunhofer-Institut fuer Lasertechnik (Germany) )

Neff, W. ( Fraunhofer-Institut fuer Lasertechnik (Germany) )

Bergmann, K. ( Fraunhofer-Institut fuer Lasertechnik (Germany) )

Biel, W. ( Forschungszentrum Juelich GmbH, EURATOM Association (Germany) )

9 more

Publication title:

Emerging Lithographic Technologies VIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5374

Pub. Year:

2004

Page(from):

808

Page(to):

817

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452870 [0819452874]

Language:

English

Call no.:

P63600/5374.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013722
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2004 : 8th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.26

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