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Membrane mask aeroelastic and thermoelastic control

Author(s):
Huston, D.R. ( Univ. of Vermont (USA) )
Plumpton, J.O. ( Univ. of Vermont (USA) )
Esser, B. ( Univ. of Vermont (USA) )
Hoelzl, S. ( Univ. of Vermont (USA) and Technical Univ. of Munich (Germany) )
Wang, X. ( Univ. of Vermont (USA) )
Sullivan, G.A. ( JMAR/SAL Nanotechnologies, Inc. (USA) )
1 more
Publication title:
Emerging Lithographic Technologies VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5374
Pub. Year:
2004
Page(from):
780
Page(to):
790
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452870 [0819452874]
Language:
English
Call no.:
P63600/5374.2
Type:
Conference Proceedings

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