Membrane mask aeroelastic and thermoelastic control
- Author(s):
Huston, D.R. ( Univ. of Vermont (USA) ) Plumpton, J.O. ( Univ. of Vermont (USA) ) Esser, B. ( Univ. of Vermont (USA) ) Hoelzl, S. ( Univ. of Vermont (USA) and Technical Univ. of Munich (Germany) ) Wang, X. ( Univ. of Vermont (USA) ) Sullivan, G.A. ( JMAR/SAL Nanotechnologies, Inc. (USA) ) - Publication title:
- Emerging Lithographic Technologies VIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5374
- Pub. Year:
- 2004
- Page(from):
- 780
- Page(to):
- 790
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452870 [0819452874]
- Language:
- English
- Call no.:
- P63600/5374.2
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Active membrane masks for improved overlay performance in proximity lithography
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
9
Conference Proceedings
Inspection of bridge columns and retaining walls with electromagnetic waves
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Aerospace electronics weight reduction through the use of active mass damping
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |