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Projection maskless lithography

Author(s):
Brandstatter, C. ( IMS Nanofabrication GmbH (Austria) )
Loeschner, H. ( IMS Nanofabrication GmbH (Austria) )
Stengl, G. ( IMS Nanofabrication GmbH (Austria) )
Lammer, G. ( IMS Nanofabrication GmbH (Austria) )
Buschbeck, H. ( IMS Nanofabrication GmbH (Austria) )
Platzgummer, E. ( IMS Nanofabrication GmbH (Austria) )
Doring, H.-J. ( Leica Microsystems Lithography GmbH (Germany) )
Elster, T. ( Leica Microsystems Lithography GmbH (Germany) )
Fortagne, O. ( Leica Microsystems Lithography GmbH (Germany) )
4 more
Publication title:
Emerging Lithographic Technologies VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5374
Pub. Year:
2004
Page(from):
601
Page(to):
609
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452870 [0819452874]
Language:
English
Call no.:
P63600/5374.2
Type:
Conference Proceedings

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