Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources

Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources

Author(s):

Vargas Lopez, E. ( Univ. of Illinois/Urbana-Champaign (USA) )
Jurczyk, B.E. ( Univ. of Illinois/Urbana-Champaign (USA) )
Jaworski, M.A. ( Univ. of Illinois/Urbana-Champaign (USA) )
Neumann, M.J. ( Univ. of Illinois/Urbana-Champaign (USA) )
Ruzic, D.N. ( Univ. of Illinois/Urbana-Champaign (USA) )

Publication title:

Emerging Lithographic Technologies VIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5374

Pub. Year:

2004

Page(from):

183

Page(to):

196

Pages:

14

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452870 [0819452874]

Language:

English

Call no.:

P63600/5374.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013721
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2004 : 8th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.26

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