Status of Philips' extreme UV source

Status of Philips' extreme UV source

Author(s):

Pankert, J. ( Philips Extreme UV GmbH (Germany) )

Bergmann, K. ( Fraunhofer-Institut fuer Lasertecknik (Germany) )

Klein, J. ( Fraunhofer-Institut fuer Lasertecknik (Germany) )

Neff, W. ( Fraunhofer-Institut fuer Lasertecknik (Germany) )

Rosier, O. ( Fraunhofer-Institut fuer Lasertecknik (Germany) )

Seiwert, S. ( Fraunhofer-Institut fuer Lasertecknik (Germany) )

Smith, C. ( Fraunhofer-Institut fuer Lasertecknik (Germany) )

Probst, S. ( Fraunhofer-Institut fuer Lasertechnik (Germany) )

Vaudrevange, D. ( Philips Extreme UV GmbH (Germany) )

Siemons, G. ( Philips Extreme UV GmbH (Germany) )

Apetz, R. ( Philips Extreme UV GmbH (Germany) )

Jonkers, J. ( Philips Extreme UV GmbH (Germany) )

Loeken, M. ( Philips Extreme UV GmbH (Germany) )

Derra, G. ( Philips Research Labs. (Germany) )

Kruecken, T. ( Philips Research Labs. (Germany) )

Zink, P. ( Philips Research Labs. (Germany) )

11 more

Publication title:

Emerging Lithographic Technologies VIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5374

Pub. Year:

2004

Page(from):

152

Page(to):

159

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452870 [0819452874]

Language:

English

Call no.:

P63600/5374.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013721
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2004 : 8th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.26

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