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Optimized glass-ceramic substrate materials for EUVL applications

Author(s):
Mitra, I. ( Schott Glas (Germany) )
Alkemper, J. ( Schott Glas (Germany) )
Mueller, R. ( Schott Glas (Germany) )
Nolte, U. ( Schott Glas (Germany) )
Engel, A. ( Schott Glas (Germany) )
Hack, H. ( Schott Glas (Germany) )
Kohlmann, H. ( Schott Glas (Germany) )
Wittmer, V. ( Schott Glas (Germany) )
Pannhorst, W. ( Schott Glas (Germany) )
Davis, M.J. ( Schott Glass Technologies Inc. (USA) )
Aschke, L. ( Schott Lithotec AG (Germany) )
Knapp, K. ( Schott Lithotec AG (Germany) )
7 more
Publication title:
Emerging Lithographic Technologies VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5374
Pub. Year:
2004
Page(from):
96
Page(to):
103
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452870 [0819452874]
Language:
English
Call no.:
P63600/5374.1
Type:
Conference Proceedings

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