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Determination of the flare specification and methods to meet the CD control requirements for the 32-nm node using EUVL

Author(s):
Chandhok, M. ( Intel Corp. (USA) )
Lee, S.H. ( Intel Corp. (USA) )
Krautschik, C. ( Intel Corp. (USA) )
Rice, B.J. ( Intel Corp. (USA) )
Panning, E. ( Intel Corp. (USA) )
Goldstein, M. ( Intel Corp. (USA) )
Shell, M. ( Intel Corp. (USA) )
2 more
Publication title:
Emerging Lithographic Technologies VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5374
Pub. Year:
2004
Page(from):
86
Page(to):
95
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452870 [0819452874]
Language:
English
Call no.:
P63600/5374.1
Type:
Conference Proceedings

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