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Shot noise, LER, and quantum efficiency of EUV photoresists

Author(s):
Brainard, R.L. ( Rohm and Haas Microelectronics (USA) )
Trefonas, P. ( Rohm and Haas Microelectronics (USA) )
Lammers, J.H. ( Philips Research Labs. (Belgium) )
Cutler, C.A. ( Rohm and Haas Microelectronics (USA) )
Mackevich, J.F. ( Rohm and Haas Microelectronics (USA) )
Trefonas, A. ( Rohm and Haas Microelectronics (USA) )
Robertson, S.A. ( Rohm and Haas Microelectronics (USA) )
2 more
Publication title:
Emerging Lithographic Technologies VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5374
Pub. Year:
2004
Page(from):
74
Page(to):
85
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452870 [0819452874]
Language:
English
Call no.:
P63600/5374.1
Type:
Conference Proceedings

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