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Current status of next-generation EUVL mask blank tool development

Author(s):
Ma, A. ( International SEMATECH (USA) )
Kemp, K.G. ( International SEMATECH (USA) )
Randive, R. ( Veeco Instruments, Inc. (USA) )
Weaver, A. ( Veeco Instruments, Inc. (USA) )
Roberti, M. ( Veeco Instruments, Inc. (USA) )
Hayes, A.V. ( Veeco Instruments, Inc. (USA) )
Abraham, D.L. ( Veeco Instruments, Inc. (USA) )
Mirkarimi, P.B. ( Lawrence Livermore National Lab. (USA) )
Spiller, E.A. ( Lawrence Livermore National Lab. (USA) )
Kearney, P.A. ( Lawrence Livermore National Lab. (USA) )
5 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
1287
Page(to):
1296
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.2
Type:
Conference Proceedings

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