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A novel electron-beam-based photomask repair tool

Author(s):
Edinger, K. ( NaWoTec GmbH (Germany) )
Becht, H. ( NaWoTec GmbH (Germany) )
Becker, R. ( NaWoTec GmbH (Germany) )
Bert, V. ( NaWoTec GmbH (Germany) )
Boegli, V.A. ( NaWoTec GmbH (Germany) )
Budach, M. ( NaWoTec GmbH (Germany) )
Gyhde, S. ( NaWoTec GmbH (Germany) )
Guyot, J. ( NaWoTec GmbH (Germany) )
Hofmann, T. ( NaWoTec GmbH (Germany) )
Hoinkis, O. ( NaWoTec GmbH (Germany) )
Kaya, A. ( NaWoTec GmbH (Germany) )
Koops, H.W. ( NaWoTec GmbH (Germany) )
Spies, P. ( NaWoTec GmbH (Germany) )
Weyrauch, B. ( NaWoTec GmbH (Germany) )
Bihr, J. ( LEO Elektronenmikroskopie GmbH (Germany) )
10 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
1222
Page(to):
1231
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.2
Type:
Conference Proceedings

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