DUV inspection capability for 90-nm node mask in ArF lithography

DUV inspection capability for 90-nm node mask in ArF lithography

Author(s):

Ohira, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Kim, B.G. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Tanaka, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Tateno, M. ( NEC Corp. (Japan) )

Takayama, N. ( NEC Corp. (Japan) )

Murakami, S. ( NEC Corp. (Japan) )

Hatta, K. ( NEC Corp. (Japan) )

Akima, S. ( Toppan Printing Co., Ltd. (Japan) )

Matsuo, F. ( Toppan Printing Co., Ltd. (Japan) )

Otaki, M. ( Toppan Printing Co., Ltd. (Japan) )

6 more

Publication title:

23rd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5256

Pub. Year:

2003

Page(from):

1181

Page(to):

1190

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451439 [0819451436]

Language:

English

Call no.:

P63600/5256.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013601
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2003 : 23rd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2003.09.09-2003.09.12

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