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Second-level imaging of advanced alternating phase-shift masks using e-beam lithography

Author(s):
Leibold, B. ( Institut fur Mikroelektronik Stuttgart (Germany) )
Butschke, J. ( Institut fur Mikroelektronik Stuttgart (Germany) )
Bettin, L. ( Leica Microsystems Lithography (Germany) )
Beyer, D. ( Leica Microsystems Lithography (Germany) )
Irmscher, M. ( Institut fyr Mikroelektronik Stuttgart (Germany) )
Koepernik, C. ( Institut fyr Mikroelektronik Stuttgart (Germany) )
Plontke, R. ( Leica Microsystems Lithography (Germany) )
Vix, A. ( Infineon Technologies AG (Germany) )
Voehringer, P. ( Institut fyr Mikroelektronik Stuttgart (Germany) )
4 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
1034
Page(to):
1044
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.2
Type:
Conference Proceedings

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