Beyond k1=0.25 lithography: 70-nm L/S patterning using KrF scanners
- Author(s):
Ebihara, T. ( Canon USA, Inc. (USA) ) Levenson, M.D. ( M.D. Levenson Consulting (USA) ) Liu, W. ( Applied Materials Inc. (USA) ) He, J. ( Applied Materials Inc. (USA) ) Yeh, W. ( Applied Materials Inc. (USA) ) Ahn, S. ( Applied Materials Inc. (USA) ) Oga, T. ( Canon USA, Inc. (USA) ) Shen, M. ( Applied Materials Inc. (USA) ) M'saad, H. ( Applied Materials Inc. (USA) ) - Publication title:
- 23rd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5256
- Pub. Year:
- 2003
- Page(from):
- 985
- Page(to):
- 994
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- Language:
- English
- Call no.:
- P63600/5256.2
- Type:
- Conference Proceedings
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