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Beyond k1=0.25 lithography: 70-nm L/S patterning using KrF scanners

Author(s):
Ebihara, T. ( Canon USA, Inc. (USA) )
Levenson, M.D. ( M.D. Levenson Consulting (USA) )
Liu, W. ( Applied Materials Inc. (USA) )
He, J. ( Applied Materials Inc. (USA) )
Yeh, W. ( Applied Materials Inc. (USA) )
Ahn, S. ( Applied Materials Inc. (USA) )
Oga, T. ( Canon USA, Inc. (USA) )
Shen, M. ( Applied Materials Inc. (USA) )
M'saad, H. ( Applied Materials Inc. (USA) )
4 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. date:
2003
Page(from):
985
Page(to):
994
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.2
Type:
Conference Proceedings

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