Blank Cover Image

Effect of mask pattern fidelity on 193-nm lithography performance

Author(s):
Cheng, C.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Su, T.-L. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Tsai, F.-G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Tsai, T.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Tu, C.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Yoo, C.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
1 more
Publication title:
23rd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5256
Pub. Year:
2003
Page(from):
937
Page(to):
944
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
Language:
English
Call no.:
P63600/5256.2
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings The investigation of 193nm CPL 3D topology mask effect on wafer process performance [6154-87]

Cheng, Y. F., Chou, Y. L., Yang, C. H.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Mask manufacturing contribution on 248-nm and 193-nm lithography performances

Barberet,A., Fanget,G.L., Richoilley,J.-C., Tissier,M., Quere,Y.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Mask pattern fidelity quantification

Wang, W.-C., Chang, S.-M., Chin, C.C., Lu, C.-L., Chin, A.S.J., Hsieh, H.-C., Yu, S.-S.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings TiSi-nitride attenuating phase-shift photomask for 193-nm lithography

Reynolds,G.A.M., French,R.H., Carcia,P.F., Torardi,C.C., Hughes,G.P., Jones,D.J., Lemon,M.F., Reilly,M., Wilson,L., …

SPIE - The International Society for Optical Engineering
3 Conference Proceedings Pattern fidelity enhancement with OPC pattern generation on laser lithography [6283-12]

Lee, G., Chung, -S. Y., Yang, -T.W., Cheng, -H. W., Lin, -J. R., Wang, S. T., Cheng, -C. Y., Chou, -J. W.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography

Dammel, R.R., Sakamuri, R., Lee, S.-H., Rahman, M.D., Kudo, T., Romano, A.R., Rhodes, L.F., Lipian, J., Hacker, C., …

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Challenges of 29nm half-pitch NAND Flash STI patterning with 193nm dry lithography and self-aligned double patterning

M. C. Chiu, B. S.-M. Lin, M. F. Tsai, Y. S. Chang, M. H. Yeh

Society of Photo-optical Instrumentation Engineers
10 Conference Proceedings Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node

Patterson, K., Litt, L.C., Maltabes, J.G., Hughes, G.P., Robertson, T., Montgomery, B.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings 25 nm immersion lithography at 193 nm wavelength

Choi, S.-H., Park, T.-H., Kim, E., Youn, H.-J., Lee, D.-Y., Ban, Y.-C., Je, A.-Y., Kim, D.-H., Hong, J.-S., Kim, Y.-H., …

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Optimization of alternating PSM mask process for 65-nm poly-gate patterning using 193-nm lithography

Tan, S.-K., Lin, Q., Hsia, L.C., Sun, S.-C.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Mask manufacturing contribution on 248-nm and 193-nm lithography performances

Barberet,A., Fanget,G.L., Richoilley,J.-C., Tissier,M., Quere,Y.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Modeling chemically amplified resists for 193-nm lithography

Croffie,E.H., Cheng,M., Neureuther,A.R., Houlihan,F.M., Cirelli,R.A., Sweeney,J.R., Dabbagh,G., Watson,G.P., …

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12