157-nm alternating phase-shifting mask design and high-NA images
- Author(s):
- Chen, Y.-T. ( Matrix Semiconductor (USA) )
- Meute, J. ( International SEMATECH (USA) )
- Dean, K. ( International SEMATECH (USA) )
- Brooker, P.D. ( SIGMA-C (USA) )
- Publication title:
- 23rd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5256
- Pub. Year:
- 2003
- Page(from):
- 905
- Page(to):
- 912
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- Language:
- English
- Call no.:
- P63600/5256.2
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Image performance and mask characterization of 157-nm alternating phase-shifting mask
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Effects of airborne molecular contamination on 157-nm resists: AMC friend or foe?
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation:I
SPIE - The International Society for Optical Engineering |
5
Conference Proceedings
Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask
SPIE-The International Society for Optical Engineering |